Physical Vapor Deposition Facilities
The experimental physical vapor deposition facilities utilized by IPML
researchers are two UVA
patented Directed Vapor Deposition (DVD)
systems and a Biased Target Ion Beam Deposition system developed
with 4WAVE.
Each
of the DVD systems utilizes an electron-beam (e-beam) gun to
vaporize materials. Both systems use specially modified axial guns
that allow creation of atomistic or molecular vapor in a low vacuum
environment making it possible to entrain the evaporant in a reactive
or inert supersonic gas jet. A photograph of one of the systems is
shown below. A second photograph shows electron beam evaporation and
entrainment in a supersonic gas jet. A plasma generation system has
been integrated in to the system and can be used to modify the
structure and composition of coatings. Current projects are exploring
the deposition of thermal barrier coating systems, thin film
capacitors, solid state batteries, solid oxide fuel cell electrode
assemblies and coatings on fibers and the trusses of cellular
materials. More information about the process and its applicatiopns
can be found in various publications. If you have additional questions
about our Directed Vapor Deposition facilities, please send
e-mail to
Haydn Wadley or contact him by phone at 434 982 5671.
Directed Vapor Deposition system
The gas jet entrained vapor plume within a second generation of Directed Vapor Deposition
We have
developed a state of the art BTIBD system using atomistic
and vapor transport models. The approach is based upon the use of a
very high ion density, low voltage plasmas to sputter up to six target
materials sequentially. The ions used for sputtering make normal
impact with the target resulting in a very low flux of high energy
reflected neutral atoms. The use of a low voltage reduces the kinetic
energy of the sputtered metal atoms, enabling the deposition of metal
superlattices (multilayers) with very little intermixing at the
interfaces. The assembly of these atoms on a substrate is manipulated
using a low voltage ion assistance system. A photograph of the
UVA facility is shown below.
Biased Target Ion Beam Deposition System - Front View
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Back View |
Biased Target Ion Beam Deposition System
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