The novel Jet Vapor Deposition (JVD) method has been used to produce Al-aluminum oxide laminate samples with nanoscale microstructure. The microstructure and properties of Al-aluminum oxide nanoscale laminates deposited at room temperature have been investigated using electron diffraction, electron microscopy and nanoindentation techniques. Preliminary results show that an imperfect, but still layered, structure was formed within the laminates. The aluminum oxide layers were entirely amorphous, whereas the Al layers were mixed amorphous/crystalline. The Al layers were not totally continuous; they contained many Al clusters (20 to 120 nm in diameter) within which many crystalline Al grains (5 - 50 nm in diameter) had nucleated. A yield strength of 770 +- 60 MPa was achieved for an Al layer thickness of 16.5 nm.