A process for vapor depositing an evaporant onto a substrate is provided which involves: presenting the substrate to a deposition chamber, wherein the deposition chamber has an operating pressure of from 0.001 Torr to atmospheric pressure and has coupled thereto a carrier gas stream generator and an electron beam gun capable of providing an electron beam at the operating pressure and contains an evaporant source; impinging the evaporant source with the electron beam to generate the evaporant; entraining the evaporant in the carrier gas stream; and coating the substrate with the carrier gas stream which contains the entrained evaporant, and an apparatus for performing the process.