A study of the feasibility of using a novel Jet Vapor Deposition (JVD) process to produce model aluminum/copper nanolaminate composites has been conducted. Nanocomposites are currently a promising area of materials research because of their sometimes novel structure-property relationships. The objectives of this project were to (a) determine the feasibility of synthesizing nanocomposites with the JVD system, (b) prepare a set of Al/Cu nanocomposites with individual layer thicknesses ranging from 20 to 1000 nm and (c) investigate the relationships between their structure and properties. The JVD system, developed by Jet Process Corporation in New Haven, CT, uses supersonic gas jets to entrain metal vapor and deposit it onto substrates. JVD potentially allows for careful control of vapor deposition from multiple sources operating either sequentially or simultaneously at high rates and at relatively low cost. Al/Cu nanolaminates were successfully synthesized using JVD, and their microstructure was characterized using SEM, TEM, Auger analysis, and X-ray diffraction. The hardness and elastic modulus of the composites were measured using nanoindentation methods. The moduli of the films were consistent with those predicted by a rule of mixtures model. When the Al layer thickness exceeded a critical value of ~50nm, the yield strength appeared to be controlled by an Orowan or a Frank-Read type of dislocation mechanism. Below this critical Al layer thickness, the yield strength seems to be controlled by interactions between dislocations in the Al layers and the Al/Cu interface. The yield strength in this regime could be predicted either by Koehler's model or a recent proposal of Embury and Hirth. Both models fir the experimentally measured yield strength equally well, although in the latter case only after optimizing a free parameter of the model. The results suggest that nanocomposite properties such as yield strength and modulus may be selected by varying the layer thickness and/or the volume fraction of the constituents. Further study of the JVD system should include real-time layer thickness monitoring, the remediation of stresses in films with greater total thicknesses and the elimination of growth defects.